YIELD Engineering Systems Inc.

Chemical Vapor Deposition (CVD) is a process widely used in the semiconductor and biotechnology industries for the deposition of a thin film of various materials in order to achieve surface modification. Whether you need a slick surface for microelectromechanical systems (MEMS) or a sticky surface for semiconductor fabrication, chemical vapor deposition will provide the desired surface modification.
Complete dehydration followed by CVD provides a superior silane/substrate bond that is stable after exposure to atmospheric moisture, extending the time available between process steps.

Hexamethyldisilizane (HMDS)/wafer bonds will last for weeks with no change to surface adhesion. Chemical usage for the vapor deposition process is typically less than 1% of the amount needed for wet application processes, significantly reducing waste and chemical costs.

More information is available on the YES-1224 product page.