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RTC WB-SERIES

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RTC WB-SERIES INFRARED OVEN 

The Wafer Bump series of continuous conduction ovens are designed especially for advanced semiconductor wafer bump reflow.  The conduction heating principle provides efficient, rapid and accurate methods of heating and controlling the temperature of the wafers during the thermal process steps.
A major benefit of this technique is the assurance through conduction heating that the temperature of the wafers processed will not differ by more than 5°C from the set point temperature of the continuous conduction HotBelt used to transport them. 
The system offers a unique TriBelt transport system that provides an ambient temperature belt for wafer loading, a hot belt for the heating section, and a cold belt for the cooling and unload station.  An important design element includes the application of the specially designed high density mesh hot belt that conducts its heat like a hot plate.  After the reflow spike, the wafers are transferred to the third belt, which is cold, for rapid cooling as depicted in the illustration.
FEATURES 

RTC WB-Series Oven

RTC Model WB-615
(click on picture to enlarge)
bullet Minimal profiling 100mm to 300mm (4" to 12") wafers processed at the same temperature setting regardless of mask patterns.
bullet Ease of operation (wafer temperature within 5°C of zone temperature at peak and plateau).
bullet Wafers transported (non pushed) by a TriBelt conveyor transport system.
bullet No wafer movement on HotBelt.
bullet Inert or reducing atmosphere (< 10 ppm Oxygen).
bullet Rapid profile changeover ( < 20 minutes 320°C to 220°C).
bullet Cleanroom compatilbe (Class 100).
bullet Flux management system.
OPTIONS 
bullet On-Screen Profiling
bullet Oxygen Analyzer
bullet Light Tower
bullet Cassette to Cassette Index Loader/Unloader
bullet Spin Coat Fluxer
bullet Moisture Analyzer 
bullet Water Cooling
bullet Recirculating Water Chiller
PRODUCT DATA SHEETS 
RTC WB-Series Overview 
SPECIFICATIONS 
MODEL NUMBER  WAFER BUMP-610  WAFER BUMP-615 
Conveyor Width 7.5 in. (19.1 cm) 12.5 in. (31.8 cm)
Heated Length 60 in. (152.4 cm) 60 in. (152.4 cm)
Cooling Length 45 in. (114.3 cm) 45 in. (114.3 cm)
Overall Width 168.5 in. (4.3 m) 168.5 in. (4.3 m)
Height 54.5 in. ± 1.5 in. (138.4cm ± 3.8 cm) 54.5 in. ± 1.5 in. (138.4cm ± 3.8 cm)
Conveyor Height 37 in. + 3 in. - 1.5 in. (94 cm + 7.6 cm - 3.81 cm) 37 in. + 3 in. - 1.5 in. (94 cm + 7.6 cm - 3.81 cm)
Number of Heated Zones 6 6
Cooling Concept Conduction cold belt and cold wall radiation heat exchanger. Controlled atmosphere capability. Conduction cold belt and cold wall radiation heat exchanger. Controlled atmosphere capability.
Heat Up Time 20 minutes 20 minutes
Average Time to Change Profile < 20 minutes < 20 minutes
Maximum Operating Temperature 600°C 600°C
Controlled process Atmosphere < 10 ppm Oxygen < 10 ppm Oxygen
Voltage 208, 240 volts, 3 phase, 50 or 60 Hz, 380, 415, 480 volts optional 208, 240 volts, 3 phase, 50 or 60 Hz, 380, 415, 480 volts optional
Peak Power/ Nominal Power 28 KW/ 9 KW 42 KW/ 12 KW
Belt Size 10 inch 15 inch
Net Weight/ Weight Crated 2200 lbs/ 2700 lbs 2400 lbs/ 2900 lbs
Specification can be changed without notice.
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Copyright © 1998 BITA ELECTRONIQUE S.A.
Last modified: 2010-08-11