 |
|
|
|
|
|
|
|
|
 |
|
YES-GLEN
1000P-LMC LOADED MAGAZINE CLEANER |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
This system is specifically designed for fast, uniform
cleaning of lead frames and other carrier borne devices loaded into either
single or dual magazines. The design provides horizontal flow of plasma
(and plasma gas) through the magazine(s) which assures uniform plasma
cleaning of components positioned anywhere within the magazine.
All readouts are in English and, in the event of an
abort, diagnostic recommendations are displayed on the system readout.
By changing positions of the slide-in electrodes, the
system can be operated in any of the three plasma modes defined in the
General Overview section. go out of limit, an audible abort signal and
flashing light will announce an abort mode and the system will
automatically shut down in a sealed condition. The system will show, in
Plain English, the reason for the shut down and suggested remedial action.
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
SERVICE
AND RELIABILITY |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
The YES- Glen System is designed with
total reliability in mind. In the unlikely event that service is required,
both system drawers simply roll out from the main console. Only hard
plumbed vacuum fittings must be accessed from the rear of the system.
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
FEATURES |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
YES-Glen 1000P-LMC
|
|
|
|
 |
1000 W plasma cleaner |
|
|
Cleans
multiple lead frames or devices loaded into magazines |
|
|
Accepts
one or two magazines up to 8 in. x 6 in. x 13 in. |
|
|
All
readouts in plain English |
|
|
Operates
in Active, Electron-free or RIE modes |
|
|
Two
plasma gas inputs |
|
|
Three plasma modes |
|
|
Parallel plate design to provide uniform plasma
throughout |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
PLASMA
SELECTION |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
Electron-free
for cleaning sensitive. electronic devices prior to wire bonding |
|
|
Active
for etching and surface modification prior to bonding |
|
|
RIE for
the most aggressive modification of material surfaces |
 |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
NOTE: The
G1000 with the new temperature control and loop
program can ideally be used as a plasma stripper. It takes about 1 hour of
continuous plasma to remove 1 micron of resist.
|
|
|
|
YES-Glen
designs and manufactures a line of PLC controlled plasma
cleaning equipment for cleaning and surface modification for many
industries including Semiconductor, Medical, Biochip, Optical and more.
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
YES-Glen
product lines form one of the most
comprehensive product ranges in the industry. Systems are available for
applications ranging from small volume R&D through higher volume
production quantities. Sample sizes range from flat panels to the smallest
semiconductor devices. Each system offers quick interchange between five
basic operating modes:
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
MILD ANISOTROPIC MODES |
|
|
|
ISOTROPIC MODES |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
Downstream, or electron free mode is used for cleaning
sensitive electronic devices prior to wire bonding. Product is on a
floating tray outside the plasma generation volume. The plasma
passes through a grounded tray to the product, balancing the charged
species to limit surface charge build-up. |
|
|
Active mode is used for etching and surface
modification prior to bonding applications. Product is on a grounded
tray inside the plasma generation area |
|
|
for cleaning sensitive electronic components normally
associated with the semiconductor industry.
|
|
|
|
|
|
|
Active Ion Trap is the most aggressive plasma for
reactive processes. Product is on an active tray outside the plasma
generation volume. Ion trap plasmas have high ion concentrations at
low energy levels. |
|
|
Downstream Ion trap is for aggressive, electron free
cleaning. Product is on a grounded tray outside the plasma
generation volume.
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
 The parallel plate design ensures uniformity of plasma
in all modes.
All RF, Vacuum and Gas control functions are safety
interlocked and the systems will shut down in a sealed mode in the event
of any parameter going outside preset limits.
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
PLASMA
GAS FLOW |
|
|
|
RIE
PLASMA FLOW |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
|
|
|
|
Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
ACTIVE
PLASMA |
|
|
|
DOWNSTREAM
ELECTRON-FREE PLASMA |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
|
|
|
|
Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
|
|
|
|
|
|
|
|
|
|
|
|
|
