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YES-GLEN
G1000 PLASMA CLEANER
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The
YES-G1000 is a 1000 Watt parallel plate system designed to give uniform
plasma over up to four large (16 x 16-inch) sample trays. It has three
plasma gas inputs and an inert gas input to enable the chamber contents to
be bought back to atmospheric pressure in a controlled environment.
All
operating parameters and real-time process readout are in plain English.
In the event of an abort situation, diagnostics are also shown in plain
English. The system has multiple recipes user selectable from the
operator's touchscreen interface.
Options
include Mass Flow Control on all three plasma gases so that any two (or
three) gases can be accurately mixed. RS 232 interface is standard and the
system is CE compliant.
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SERVICE
AND RELIABILITY |
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The YES-Glen System is designed with
total reliability in mind. In the unlikely event that service is required,
both system drawers simply roll out from the main console. Only hard
plumbed vacuum fittings must be accessed from the rear of the system.
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FEATURES |
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YES-Glen G1000
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1000 W parallel plate plasma cleaner |
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Four (4), 16 x 16 in. shelves |
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Total capacity = 1024 sq. in. |
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Full PLC Control |
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Touchscreen Operator Interface |
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Self
Diagnostic Program |
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PLASMA
SELECTION |
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Electron-free
for cleaning sensitive, electronic devices prior to wire bonding |
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Active
for etching and surface modification prior to bonding |
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RIE for
the most aggressive modification of material surfaces |
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NOTE: The
G1000 with the new temperature control and loop program can ideally be
used as a plasma stripper. It takes about 1 hour of continuous plasma to
remove 1 micron of resist.
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YES-Glen
designs and manufactures a line of PLC controlled plasma
cleaning equipment for cleaning and surface modification for many
industries including Semiconductor, Medical, Biochip, Optical and more.
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YES-Glen
product lines form one of the most
comprehensive product ranges in the industry. Systems are available for
applications ranging from small volume R&D through higher volume
production quantities. Sample sizes range from flat panels to the smallest
semiconductor devices. Each system offers quick interchange between five
basic operating modes:
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MILD ANISOTROPIC MODES |
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ISOTROPIC MODES |
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Downstream, or electron free mode is used for cleaning
sensitive electronic devices prior to wire bonding. Product is on a
floating tray outside the plasma generation volume. The plasma
passes through a grounded tray to the product, balancing the charged
species to limit surface charge build-up. |
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Active mode is used for etching and surface
modification prior to bonding applications. Product is on a grounded
tray inside the plasma generation area |
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for cleaning sensitive electronic components normally
associated with the semiconductor industry.
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Active Ion Trap is the most aggressive plasma for
reactive processes. Product is on an active tray outside the plasma
generation volume. Ion trap plasmas have high ion concentrations at
low energy levels. |
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Downstream Ion trap is for aggressive, electron free
cleaning. Product is on a grounded tray outside the plasma
generation volume.
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 The parallel plate design ensures uniformity of plasma
in all modes.
All RF, Vacuum and Gas control functions are safety
interlocked and the systems will shut down in a sealed mode in the event
of any parameter going outside preset limits.
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PLASMA
GAS FLOW |
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RIE
PLASMA FLOW |
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Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
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Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
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ACTIVE
PLASMA |
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DOWNSTREAM
ELECTRON-FREE PLASMA |
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Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
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Click on picture to
enlarge
(Picture from YES-Glen 1000P-LMC Magazine System)
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