BTU INTERNATIONAL

BTU’s TCD Series furnaces have been optimized for the deposition of TiO2 anti-reflective coating. This is accomplished by the use of the Atmospheric Chemical Vapor Deposition (APCVD) process. The system is available in 1 or 2 head configurations depending on throughput requirements.

16 INCH - 1 HEAD

15 INCH - 2 HEAD

Maximum Temp Rating

500 °C

Heated Zones

7

9

Heated Length

63 in. (1600 mm)

120 in. (3048 mm)

Conveyor Width 

16 in. (406 mm)

16 in. (406 mm)

Belt Material

Incoloy

Atmosphere

N2

Injector Heads

1

2

Cooling

48 in. (1219 mm) Water

Anti-reflective thin film coating is required in the manufacture of solar cells to aide in the entrapment of light into the cell. It is typically applied by the atmospheric pressure chemical deposition process (APCVD) using titanium oxide (TiO2) or plasma enhanced chemical vapor deposition (PECVD) using silicon nitride. BTU offers it’s TCD furnace for the application of anti-reflective coating which is the APCVD process. This is an in-line solution.